M. Miura

发表

Crystallographic Character of ZnO Thin Film Formed at Low Sputtering Gas Pressure

M. Miura, 1982 .

Annealing behavior of magnetic anisotropy in CoNbZr films

M. Kajiyama, M. Miura, H. Katahashi, 1988 .

Magnetic and Crystallographical Characteristics of the Sendust Films formed by DC Opposite Sputtering Method

Katsuyuki Tanaka, M. Miura, Y. Noro, 1986 .

Crystallographic and magnetic behavior in crystallization process of FeTaC film

A. Obata, M. Miura, 1996 .

Selective atomic-level etching using two heating procedures, infrared irradiation and ion bombardment, for next-generation semiconductor device manufacturing

Kenji Maeda, Masaru Hori, Hiroyuki Kobayashi, 2017 .

Be-Cr-doped high-corrosion-resistant magneto-optical disks

S. Yoshida, T. Fujii, T. Ohashi, 1991 .

Formation of CoNbZr films by a dc opposing‐target sputtering method

Katsuyuki Tanaka, M. Miura, Hitoshi Itegami, 1986 .