Craig E. Moore

Development of an advanced computational model for OMCVD of indium nitride

Donald O. Frazier, Ning Zhou, Anantha Krishnan, 1999, Photonics West.

NASA/ASEE SUMMER FACULTY FELLOWSHIP PROGRAM

Craig E. Moore, Beatriz H. Cardelino, 2002 .

Mask technology for EUV lithography

Pei-yang Yan, Donald W. Sweeney, Sungho Jeong, 1999, European Mask and Lithography Conference.

Extreme ultraviolet lithography: reflective mask technology

Scott Daniel Hector, Sherry L. Baker, Karl Wilhelmsen, 2000, Advanced Lithography.

Advanced computational modeling for growing III-V materials in a high-pressure chemical vapor-deposition reactor

Nikolaus Dietz, Craig E. Moore, Beatriz H. Cardelino, 2005, SPIE Optics + Photonics.

Masks for extreme ultraviolet lithography

Scott Daniel Hector, Pei-Yang Yan, Cindy C. Larson, 1998, Photomask Technology.

Aromaticity and conjugation effects on the nonlinear optical properties of multidimensional molecules

Craig E. Moore, Beatriz H. Cardelino, 1996, Optics & Photonics.

Mask blanks for extreme ultraviolet lithography: Ion beam sputter deposition of low defect density Mo/Si multilayers

Patrick A. Kearney, Craig E. Moore, Stephen P. Vernon, 1996 .

Semiclassical Calculation of Reaction Rate Constants for Homolytical Dissociation Reactions of Interest in Organometallic Vapor-Phase Epitaxy (OMVPE)

Donald O. Frazier, Carlos A. Cardelino, Craig E. Moore, 2003 .