Dominic Changwon Yang

New positive-tone deep-UV photoresist based on poly(4-hydroxystyrene) and an acid labile protecting group

William R. Brunsvold, George M. Jordhamo, Will Conley, 1995, Advanced Lithography.

Chemistry of Ketal Resist System and Its Lithographic Performance

William R. Brunsvold, Roger F. Sinta, Ronald W. Nunes, 1998 .