C. D. Himmel

Time series modeling of reactive ion etching using neural networks

Gary S. May, M. D. Baker, C. D. Himmel, 1995 .

Real-time predictive control of semiconductor manufacturing processes using neural networks

G. S. May, E. W. Kamen, C. D. Himmel, 1995, Proceedings of 1995 American Control Conference - ACC'95.

Advantages of plasma etch modeling using neural networks over statistical techniques

Gary S. May, C. D. Himmel, G. May, 1993 .

In-situ prediction of reactive ion etch endpoint using neural networks

Gary S. May, C. D. Himmel, M. D. Baker, 1995 .

A comparison of statistically-based and neural network models of plasma etch behavior

Gary S. May, C. D. Himmel, G. May, 1992, [1992 Proceedings] IEEE/SEMI International Semiconductor Manufacturing Science Symposium.