Diederik J. Maas

Impact of pixel-dose optimization on pattern fidelity for helium ion beam lithography on EUV resist

Nima Kalhor, Wouter Mulckhuyse, Paul F. A. Alkemade, 2015, Advanced Lithography.

Increased particle inspection sensitivity by reduction of background scatter variance

Richard Versluis, Diederik J. Maas, Peter van der Walle, 2013, Advanced Lithography.

Nanoparticle detection limits of TNO's Rapid Nano: modeling and experimental results

Diederik J. Maas, Peter van der Walle, Pragati Kumar, 2012, Photomask Technology.