T. Hansen

Vacuum ultra-violet emission of CF4 and CF3I containing plasmas and Their effect on low-k materials

J. de Marneffe, M. Baklanov, A. Zotovich, 2015 .

Pattern Roughness Mitigation of 22 nm Lines and Spaces: The Impact of a H2 Plasma Treatment

A. V. Pret, S. Gendt, P. D. Schepper, 2015 .

B-spline parametrization of the dielectric function applied to spectroscopic ellipsometry on amorphous carbon

Van de Sanden, R. Engeln, T. Hansen, 2009 .

Synergistic etch rates during low-energetic plasma etching of hydrogenated amorphous carbon

Van de Sanden, R. Engeln, T. Hansen, 2012 .

Line edge and width roughness smoothing by plasma treatment

Stefan De Gendt, Peter De Schepper, Terje Hansen, 2014 .