Julie Neff

Mask Defect Printability and Wafer Process Critical Dimension Control at 0.25 µm Design Rules

Pei–yang Yan, Joe Langston, Julie Neff, 1995 .

Development of an automated multiple-target mask CD disposition system to enable new sampling strategy

Jian Ma, Ying Cui, Jeff Farnsworth, 2006, SPIE Advanced Lithography.