J. Lintymer

发表

Influence of zigzag microstructure on mechanical and electrical properties of chromium multilayered thin films

N. Martin, P. Delobelle, J. Chappé, 2004 .

Glancing angle deposition to modify microstructure and properties of sputter deposited chromium thin films

N. Martin, J. Gavoille, J. Takadoum, 2003 .

Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process

N. Martin, J. Chappé, J. Takadoum, 2007 .

Substrate temperature and water vapour effects on structural and mechanical properties of TiOxNy coatings

N. Martin, J. Chappé, J. Gavoille, 2006 .

Reactive sputtering of TiOxNy coatings by the reactive gas pulsing process: Part II: The role of the duty cycle

F. Vaz, N. Martin, J. Chappé, 2007 .

Water as reactive gas to prepare titanium oxynitride thin films by reactive sputtering

Nicolas Martin, Guy Terwagne, N. Martin, 2003 .

Nitrogen pulsing to modify the properties of titanium nitride thin films sputter deposited

N. Martin, J. Gavoille, J. Takadoum, 2002 .

Reactive sputtering of TiOxNy coatings by the reactive gas pulsing process. Part I: Pattern and period of pulses

F. Vaz, N. Martin, J. Chappé, 2007 .

Reactive sputtering of TiOxNy coatings by the reactive gas pulsing process: Part III: The particular case of exponential pulses

F. Vaz, N. Martin, J. Chappé, 2007 .

Modeling of Young's modulus, hardness and stiffness of chromium zigzag multilayers sputter deposited

N. Martin, P. Delobelle, J. Chappé, 2006 .

Nanoindentation of chromium zigzag thin films sputter deposited

N. Martin, P. Delobelle, J. Chappé, 2005 .

Influence of substrate temperature on titanium oxynitride thin films prepared by reactive sputtering

J. Pierson, N. Martin, J. Chappé, 2004 .

Glancing angle deposition to control microstructure and roughness of chromium thin films

N. Martin, J. Chappé, J. Takadoum, 2008 .