Jae-Gon Kim

Nucleation and growth of aluminium oxide on silicon in the CVD process

Sung-woo Choi, Chul-Woong Kim, J. Chun, 1987 .

The effect of reactant gas composition on the plasmaenhanced chemical vapour deposition of TiN

D. Jang, J. Chun, Jae-Gon Kim, 1989 .

The deposition rate and properties of the deposit in plasma enhanced chemical vapor deposition of TiN

D. Jang, J. Chun, Jae-Gon Kim, 1989 .

THE EFFECTS OF REACTION PARAMETERS ON THE DEPOSITION CHARACTERISTICS IN AL2O3 CVD

C. Park, J. Chun, Jae-Gon Kim, 1983 .

Effect of partial pressure of the reactant gas on the chemical vapour deposition of Al2O3

C. Park, J. Chun, Jae-Gon Kim, 1982 .