A. Tserepi

Kinetics of F atoms and fluorocarbon radicals studied by threshold ionization mass spectrometry in a microwave CF4 plasma

W. Schwarzenbach, N. Sadeghi, J. Derouard, 1997 .

CF2 kinetics and related mechanisms in the presence of polymers in fluorocarbon plasmas

N. Sadeghi, J. Booth, J. Derouard, 1997 .

Kinetics of Radicals in Fluorocarbon Plasmas for Treatment of Polymers

N. Sadeghi, J. Booth, J. Derouard, 1997 .

Mass Spectrometric Detection of F Atoms and CFx Radicals in CF 4 Plasmas

W. Schwarzenbach, A. Tserepi, Jacques Derouard Jacques Derouard, 1997 .

Reversible pressure-induced switching of droplet mobility after impingement on porous surface media

N. Vourdas, V. Stathopoulos, A. Tserepi, 2013 .

Surface roughness induced by plasma etching of Si-containing polymers

E. Gogolides, V. Constantoudis, I. Raptis, 2003 .