Georg Roeder

Virtual metrology for prediction of etch depth in a trench etch process

Martin Schellenberger, Georg Roeder, Lothar Pfitzner, 2013, ASMC 2013 SEMI Advanced Semiconductor Manufacturing Conference.

Feasibility Evaluation of Virtual Metrology for the Example of a Trench Etch Process

Martin Schellenberger, Georg Roeder, Lothar Pfitzner, 2014, IEEE Transactions on Semiconductor Manufacturing.

Trends in european R&D : Advanced process control down to atomic scale for micro-and nanotechnologies

Martin Schellenberger, Georg Roeder, Lothar Pfitzner, 2006 .