S. Bos

Critical dimension uniformity characterization of nanoimprinted trenches for high volume manufacturing qualification

H. Teyssedre, L. Pain, S. Landis, 2016, European Mask and Lithography Conference.

Balancing Block Copolymer Thickness over Template Density in Graphoepitaxy Approach

I. Cayrefourcq, J. Hazart, L. Pain, 2017 .

Nanoimprint, DSA, and multi-beam lithography: patterning technologies with new integration challenges

F. Delachat, M. May, H. Teyssedre, 2017, Advanced Lithography.

DSA planarization approach to solve pattern density issue

S. Barnola, X. Chevalier, R. Tiron, 2015, Advanced Lithography.

Process highlights to enhance directed self-assembly contact patterning performances

Célia Nicolet, Christophe Navarro, Maxime Argoud, 2016 .

Placement error in directed self-assembly of block copolymers for contact hole application

J. Hazart, Alain Ostrovsky, Patricia Pimenta Barros, 2016 .