T. Yoshimi

Low‐Temperature Out‐Diffusion of Cu from Silicon Wafers

H. Abe, M. Shabani, T. Yoshimi, 1996 .

A Quantitative Method of Metal Impurities Depth Profiling for Gettering Evaluation in Silicon Wafers

M. Shabani, A. Kaniava, T. Yoshimi, 1997 .

Effect of Solidification Induced Defects in CZ- Silicon Upon Thin Gate Oxide Integrity

H. Koya, H. Suga, H. Abe, 1993 .

Quantitative Analysis of Surface Contaminations on Si Wafers by Total Reflection X-Ray Fluorescence

E. Morita, J. Ryuta, T. Yoshimi, 1992 .

Adsorption and Desorption of Metallic Impurities on Si Wafer Surface in SC1 Solution

Hideyuki Kondo, Yasushi Shimanuki, Jiro Ryuta, 1992 .