Narender Rana

发表

The measurement uncertainty challenge of advanced patterning development

Chas Archie, Narender Rana, Wei Lu, 2009, Advanced Lithography.

Holistic metrology approach: hybrid metrology utilizing scatterometry, critical dimension-atomic force microscope and critical dimension-scanning electron microscope

Peter Ebersbach, Charles N. Archie, Alok Vaid, 2011 .

3D-AFM enhancement for CD metrology dedicated to lithography sub-28-nm node requirements

Christophe Dezauzier, J. Foucher, Narender Rana, 2010, Advanced Lithography.

Hybrid reference metrology exploiting patterning simulation

Chas Archie, Narender Rana, 2010, Advanced Lithography.

New techniques in large scale metrology toolset data mining to accelerate integrated chip technology development and increase manufacturing efficiencies

Roger Cornell, P. Lindo, Paul Llanos, 2014, Advanced Lithography.

A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM

Peter Ebersbach, Alok Vaid, Cornel Bozdog, 2011, Advanced Lithography.

Tool-to-tool matching issues due to photoresist shrinkage effects

Alok Vaid, Benjamin Bunday, Aaron Cordes, 2011, Advanced Lithography.

Bridging CD metrology gaps of advanced patterning with assistance of nanomolding

Dario L. Goldfarb, Narender Rana, 2012, Advanced Lithography.

High repeatability CD-SEM metrology of disk drive writer and extraction of SWA (Conference Presentation)

Sergey Babin, Narender Rana, Igor Ivonin, 2018 .

Time-dependent electron-beam-induced photoresist shrinkage effects

Carsten Hartig, Alok Vaid, Benjamin Bunday, 2012 .