H. Bourdon

Selective SiGe Etching Formed by Localized Ge Implantation on SOI

D. Lenoble, C. Fenouillet-Béranger, P. Coronel, 2005 .

3D Pattern Effects in RTA Radiative vs Conductive Heating

E. Rosseel, E. Granneman, K. Verheyden, 2006 .

Defect evolution and C+/F+ co-implantation in millisecond Flash annealed ultra-shallow junctions

F. Cristiano, R. Duffy, P. Fazzini, 2008, Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08).

Bibliographie de l’auteur

D. Dutartre, S. Monfray, N. Loubet, 2014, Un nouveau référentiel pour la culture ?.

Investigation of Excimer Laser Annealing of Si using Photoluminescence at Room Temperature

D. Dutartre, A. Halimaoui, J. Venturini, 2007, 2007 15th International Conference on Advanced Thermal Processing of Semiconductors.

Low Thermal Budget Activation of B in Si

D. Dutartre, A. Talbot, O. Marcelot, 2006, 2006 14th IEEE International Conference on Advanced Thermal Processing of Semiconductors.