Nobuyuki Yokoyama

发表

32×32 strictly non-blocking Si-wire optical switch on ultra-small die of 11×25 mm2

Ken Tanizawa, Shu Namiki, Keijiro Suzuki, 2015, 2015 Optical Fiber Communications Conference and Exhibition (OFC).

Silicon photonics based 1 × 2 wavelength selective switch using fold-back arrayed-waveguide gratings

Hiroyuki Tsuda, Ken Tanizawa, Shu Namiki, 2018, IEICE Electron. Express.

Low-loss and flatband silicon-nanowire-based 5th-order coupled resonator optical waveguides (CROW) fabricated by ArF-immersion lithography process on a 300-mm SOI wafer

Minoru Ohtsuka, Nobuyuki Yokoyama, Miyoshi Seki, 2014, Photonics West - Optoelectronic Materials and Devices.

Polarization-Diversity 32 × 32 Si Photonics Switch with Non-Duplicate Diversity Circuit in Double-Layer Platform

Koji Yamada, Shu Namiki, Keijiro Suzuki, 2019, 2019 Optical Fiber Communications Conference and Exhibition (OFC).

Evaluation of the phase error in Si-wire arrayed-waveguide gratings fabricated by ArF-immersion photolithography

Hiroyuki Tsuda, Ken Tanizawa, Shu Namiki, 2015, IEICE Electron. Express.

Nonduplicate Polarization-Diversity 32 × 32 Silicon Photonics Switch Based on a SiN/Si Double-Layer Platform

Koji Yamada, Shu Namiki, Keijiro Suzuki, 2020, Journal of Lightwave Technology.

The impacts of ArF Excimer Immersion Lithography on Integrated Silicon Photonics Tech.

Munehiro Toyama, Minoru Ohtsuka, Nobuyuki Yokoyama, 2012 .

Low-loss, flat-topped and spectrally uniform silicon-nanowire-based 5th-order CROW fabricated by ArF-immersion lithography process on a 300-mm SOI wafer.

Minoru Ohtsuka, Nobuyuki Yokoyama, Miyoshi Seki, 2013, Optics express.

Ultrahigh-Q photonic crystal nanocavities fabricated by CMOS process technologies.

Minoru Ohtsuka, Nobuyuki Yokoyama, Miyoshi Seki, 2017, Optics express.

Si wire array waveguide grating with stray light reduction scheme fabricated by ArF excimer immersion lithography

Nobuyuki Yokoyama, Miyoshi Seki, Keiji Koshino, 2013 .

Si wire array waveguide grating with parallel star coupler configuration fabricated by ArF excimer immersion lithography

Munehiro Toyama, Minoru Ohtsuka, Nobuyuki Yokoyama, 2013 .