Nicholas A. Strnad

Growth of thin film ferroelectric PZT, PHT, and antiferroelectric PHO from atomic layer deposition precursors

J. Pulskamp, R. Polcawich, B. Hanrahan, 2020 .

Plasmonic-Enhancement of the Electro-Oxidation of Ethanol in Alkaline Media with Au-Fe2O3 Thin Film, Embedded, Sandwich and Surface Configurations

Joshua P. McClure, D. Baker, N. Das, 2017 .

Plasma enhanced atomic layer deposition of textured aluminum nitride on platinized substrates for MEMS

J. Pulskamp, G. Rayner, G. Fox, 2022, Journal of Vacuum Science & Technology A.

The other model antiferroelectric: PbHfO3 thin films from ALD precursors

M. Guennou, B. Hanrahan, Shi Liu, 2021, APL Materials.

Density and size effects on the thermal conductivity of atomic layer deposited TiO2 and Al2O3 thin films

Brandon D. Piercy, M. Losego, B. Donovan, 2018 .

Dielectric, energy storage, and loss study of antiferroelectric-like Al-doped HfO2 thin films

Jacob L. Jones, B. Hanrahan, A. Leff, 2020 .

Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes

Jacob L. Jones, B. Hanrahan, Younghwan Lee, 2022, Applied Physics Letters.

Extending atomic layer deposition for use in next-generation piezoMEMS: Review and perspective

J. Pulskamp, R. Polcawich, B. Hanrahan, 2023, Journal of Vacuum Science & Technology A.