K. Hsu

发表

Ultra-thin gate dielectrics grown by low-temperature processes for applications to ULSI devices

H. Hwang, P. C. Chen, K. Hsu, 1996 .

Characterizations of ultra-thin dielectrics grown by microwave afterglow O2/N2O plasma oxidation at low temperature with rapid thermal annealing

J. Loferski, H. Hwang, P. C. Chen, 1995 .

A lateral injection porous silicon device structure for light-emitting diodes

H. Hwang, Chih‐Hao Lee, C. Yeh, 1995 .

Polycrystalline Silicon Grown on Porous Silicon-on-Insulator Substrates

C. Yeh, Chih‐Hao Lee, K. Hsu, 1996 .

Fundamental studies of p-type doping of CdTe

Klaus Y. J. Hsu, Huey-Liang Hwang, H. Y. Ueng, 1996 .

Characterization of Ultrathin Dielectrics Grown by Microwave Afterglow Oxygen and N2O Plasma

Jian-Yang Lin, K. Hsu, Po–ching Chen, 1995 .

Characterization of porous silicon-on-insulator films prepared by anodic oxidation

H. Hwang, C. Yeh, Chih‐Hao Lee, 1996 .

Formation of bottom oxides in porous silicon films by anodic oxidation

C. Yeh, K. Hsu, Ching Lee, 1996 .

A Study of Photoconductivity Characteristics of Porous Si

P. C. Chen, Y. Yeh, Y. C. Yeh, 1993 .

Enhancing the photoresponsivity of bipolar phototransistors for near-infrared detection

K. Hsu, Keng-Hui Shen, Yanling Chang, 2016 .

A Graphene/Polycrystalline Silicon Photodiode and Its Integration in a Photodiode–Oxide–Semiconductor Field Effect Transistor

P. Chiu, K. Hsu, Bo-Chang Li, 2020, Micromachines.

Fundamental electrical properties of fluorinated and N2O plasma‐annealed ultrathin silicon oxides grown by microwave plasma afterglow oxidation at low temperatures

H. Hwang, J. Lin, P. C. Chen, 1994 .