Michael J. Eller

Nano-scale molecular analysis of positive tone photo-resist films with varying dose

Peter Trefonas, Michael J. Eller, Mingqi Li, 2020, Advanced Lithography.

Nanoscale molecular analysis of photoresist films with massive cluster secondary-ion mass spectrometry

Peter Trefonas, Michael J. Eller, Xisen Hou, 2019, Journal of Micro/Nanolithography, MEMS, and MOEMS.

Nano-scale molecular analysis of photo-resist films with massive cluster secondary ion mass spectrometry

Peter Trefonas, Michael J. Eller, Mingqi Li, 2019, Advanced Lithography.

Bottom-up/top-down high resolution, high throughput lithography using vertically assembled block bottle brush polymers

James W. Thackeray, Ang Li, Corrie Clark, 2013, Advanced Lithography.

Bottom-up/top-down, high-resolution, high-throughput lithography using vertically assembled block bottle brush polymers

James W. Thackeray, Peter Trefonas, Ang Li, 2013 .

Understanding photoacid generator distribution at the nanoscale using massive cluster secondary ion mass spectrometry

Emile A. Schweikert, Peter Trefonas, Michael J. Eller, 2019 .

Understanding the photoacid generator distribution at nanoscale using massive cluster secondary ion mass spectrometry

Peter Trefonas, Michael J. Eller, Mingqi Li, 2019, Advanced Lithography.

Nanoscopic cylindrical dual concentric and lengthwise block brush terpolymers as covalent preassembled high-resolution and high-sensitivity negative-tone photoresist materials.

James W. Thackeray, Peter Trefonas, Michael J. Eller, 2013, Journal of the American Chemical Society.

Time‐of‐flight secondary ion mass spectrometry imaging of biological samples with delayed extraction for high mass and high spatial resolutions

Michael J. Eller, David Touboul, Nicolas Elie, 2015, Rapid communications in mass spectrometry : RCM.