Takeru Kinoshita

Optical transparency of SiO2 glass in vacuum ultraviolet region and defect formation by F2 laser

Masahiro Hirano, Hideo Hosono, Takeru Kinoshita, 2001, SPIE Laser Damage.

Study on exposure contrast of an EUV mask

Takeru Kinoshita, Osamu Nagarekawa, Morio Hosoya, 2003, Photomask Japan.

Process development of 6-in EUV mask with TaBN absorber

Youichi Usui, Takeru Kinoshita, Hideo Kobayashi, 2002, Photomask Japan.

Fabrication of programmed phase defects on EUV multilayer blanks

Takeru Kinoshita, Hideo Kobayashi, Osamu Nagarekawa, 2003, SPIE Photomask Technology.

Damage-free extreme ultraviolet mask with TaBN absorber

Takeru Kinoshita, Osamu Nagarekawa, Morio Hosoya, 2003 .

Materials design and example of long lasting phosphorescent glasses utilizing electron trapped centers

Hideo Hosono, Takeru Kinoshita, H. Hosono, 2000 .