Guanyong Yan

发表

Analytical analysis for impact of polarization aberration of projection lens on lithographic imaging quality

Sikun Li, Xiangzhao Wang, Lina Shen, 2015, Advanced Lithography.

Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography

Xiaolei Liu, Sikun Li, Andreas Erdmann, 2014 .

High-order aberration measurement technique based on a quadratic Zernike model with optimized source

Sikun Li, Anatoly Bourov, Andreas Erdmann, 2013 .

In situ aberration measurement method using a phase-shift ring mask

Sikun Li, Andreas Erdmann, Xiangzhao Wang, 2014, Advanced Lithography.

Practical application of aerial image by principal component analysis to measure wavefront aberration of lithographic lens

Anatoly Bourov, Xiangzhao Wang, Lifeng Duan, 2012 .

In situ aberration measurement technique based on quadratic Zernike model

Sikun Li, Anatoly Bourov, Andreas Erdmann, 2012, Optical Systems Design.

Fast rigorous model for mask spectrum simulation and analysis of mask shadowing effects in EUV lithography

Xiaolei Liu, Sikun Li, Andreas Erdmann, 2014, Advanced Lithography.

Lithography and OPC friendly triple patterning decomposition method for VIA

Liang Li, Guanyong Yan, Xiao Chen, 2017, Advanced Lithography.

In situ aberration measurement technique based on an aerial image with an optimized source

Sikun Li, Anatoly Bourov, Andreas Erdmann, 2013 .

Pixelated source optimization for optical lithography via particle swarm optimization

Sikun Li, Xiangzhao Wang, Lei Wang, 2016 .

Source optimization using particle swarm optimization algorithm in photolithography

Sikun Li, Xiangzhao Wang, Lei Wang, 2015, Advanced Lithography.

In situ aberration measurement technique based on aerial image with optimized source

Sikun Li, Anatoly Bourov, Andreas Erdmann, 2012, Optical Systems Design.

A defocus measurement method for an in situ aberration measurement method using a phase-shift ring mask

Sikun Li, Andreas Erdmann, Xiangzhao Wang, 2014, Advanced Lithography.

In situ aberration measurement method using a phase-shift ring mask

Sikun Li, Xiangzhao Wang, Lifeng Duan, 2014 .

Metrology and deep learning integrated solution to drive OPC model accuracy improvement

Ming Li, Wei Yuan, Yanjun Xiao, 2019, Advanced Lithography.

Analytical analysis of the impact of polarization aberration of projection lens on lithographic imaging

Sikun Li, Xiangzhao Wang, Lina Shen, 2015 .

Experimental determination of aberration in lithographic lens by aerial image

Anatoly Bourov, Xiangzhao Wang, Lifeng Duan, 2011, Optical Systems Design.

In situ aberration measurement technique based on multi-illumination settings and principal component analysis of aerial images

Lifeng Duan, Guanyong Yan, Yang Bu, 2012 .

General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination.

Heng Zhang, Sikun Li, Lina Shen, 2016, Journal of the Optical Society of America. A, Optics, image science, and vision.