Man-Ping Cai

From simulation to characterization - integrated approach for Self Aligned Double Patterning defectivity

Chris Ngai, Doron Meshulach, Amiad Conley, 2008, 2008 International Symposium on Semiconductor Manufacturing (ISSM).

CMP process development based on rapid automatic defect classification

Andrew Skumanich, Man-Ping Cai, 1999, Other Conferences.

Directed self-assembly defectivity assessment. Part II

Ofir Montal, Kfir Dotan, Joy Cheng, 2012, Advanced Lithography.

Defect reduction methodologies for damascene interconnect process development

Andrew Skumanich, Man-Ping Cai, 1999, Advanced Lithography.