K. L. Sequoia

发表

Ablation depth in planar Sn targets during the interaction with a Nd:YAG laser for extreme ultraviolet lithography

Mark S. Tillack, Farrokh Najmabadi, K. L. Sequoia, 2009, Advanced Lithography.

Metrology Statistics for NIF Tuning Campaign

K. L. Sequoia, Richard Stephens, Steven W. Haan, 2011 .

Effects of the ratio of sphere size to laser focal spot on the dominant in-band EUV emitting region

Mark S. Tillack, Farrokh Najmabadi, K. L. Sequoia, 2009, Advanced Lithography.

Dynamics of laser-produced Sn-based plasmas for a monochromatic 13.5 nm extreme ultraviolet source

Mark S. Tillack, Farrokh Najmabadi, K. L. Sequoia, 2007, SPIE Optical Engineering + Applications.

A mass-limited Sn target irradiated by dual laser pulses for an EUVL source

K. L. Sequoia, Y. Tao, Mark S. Tillack, 2007, SPIE Advanced Lithography.

Investigation of the interaction of a laser pulse with a preformed Gaussian Sn plume for an extreme ultraviolet lithography source

Mark S. Tillack, Farrokh Najmabadi, K. L. Sequoia, 2007 .

Optimization of the size ratio of Sn sphere and laser focal spot for an extreme ultraviolet light source

Mark S. Tillack, Farrokh Najmabadi, K. L. Sequoia, 2008 .

CH Capsule Fabrication for Ignition Tuning Campaign

K. L. Sequoia, K. A. Moreno, Abbas Nikroo, 2011 .

Two dimensional expansion effects on angular distribution of 13.5nm in-band extreme ultraviolet emission from laser-produced Sn plasma

Mark S. Tillack, K. L. Sequoia, R. Burdt, 2008 .

Efficient 13.5nm extreme ultraviolet emission from Sn plasma irradiated by a long CO2 laser pulse

Mark S. Tillack, Farrokh Najmabadi, K. L. Sequoia, 2008 .