J. Doyle

发表

Physics and chemistry of hot-wire chemical vapor deposition from silane: Measuring and modeling the silicon epitaxy deposition rate

H. Branz, C. Teplin, P. Stradins, 2010 .

SURFACE REACTION PROBABILITY IN HYDROGENATED AMORPHOUS SILICON GROWTH

J. Abelson, A. Nuruddin, J. Doyle, 1994 .

Hydrogen release kinetics during reactive magnetron sputter deposition of a‐Si:H: An isotope labeling study

J. Abelson, L. Mandrell, J. Doyle, 1994 .

Reactive Magnetron Sputtering: In Situ Analyses of Particle Fluxes and Interactions with the Growth Surface

J. Abelson, L. Mandrell, N. Maley, 1992 .

Macro-Trench Studies of Surface Reaction Probability of a-Si:H Film Growth

J. Abelson, A. Nuruddin, J. Doyle, 1992 .

The Effect of Oxygen Contamination on the Electronic Properties of Hot-Wire CVD Amorphous Silicon Germanium Alloys

S. Golledge, H. Branz, A. Mahan, 2006 .

Energetic particle fluxes in magnetron sputter deposition of a-Si:H

J. Abelson, A. M. Myers, N. Maley, 1991 .

Energy Resolved Mass Spectrometry of the a-Si:D Film Growth Species During DC Magnetron Sputtering

J. Abelson, D. Ruzic, A. M. Myers, 1990 .

Production of high-quality amorphous silicon films by evaporative silane surface decomposition

Alan Gallagher, James R. Doyle, R. Robertson, 1988 .

Nickel-base brazing filler metals for aircraft gas turbine application

R. D. Eng, J. Doyle, E. J. Ryan, 1977 .

Germane discharge chemistry

Alan Gallagher, James R. Doyle, A. Gallagher, 1991 .

Silane dissociation products in deposition discharges

A. Gallagher, D. Doughty, J. Doyle, 1990 .

Effect of Near-Substrate Plasma Density in the Reactive Magnetron Sputter Deposition of Hydrogenated Amorphous Germanium

S. Fazzio, K. Braam, T. Kaufman-Osborn, 2012 .

Effects of surface topography on oxide deposition rates using TEOS/O2 chemistry

J. Doyle, G. Feng, 1999 .

Argon sputtering analysis of the growing surface of hydrogenated amorphous silicon films

A. Gallagher, J. Doyle, G. Lin, 1988 .

Surface reaction probability of film‐producing radicals in silane glow discharges

A. Gallagher, D. Doughty, J. Doyle, 1990 .

Plasma chemistry in disilane discharges

A. Gallagher, D. Doughty, J. Doyle, 1992 .

Plasma chemistry in silane/germane and disilane/germane mixtures

A. Gallagher, D. Doughty, J. Doyle, 1992 .

In Situ Measurements of Hydrogen Flux, Surface Coverage, Incorporation and Desorption During Magnetron Sputter-Deposition of A-SI:H.

J. Abelson, L. Mandrell, D. Ruzic, 1991 .

Isotopic hydrogen exchange studies of the a-Si:H surface during growth

J. Abelson, L. Mandrell, A. M. Myers, 1989 .

Plasma Chemistry in Silane and Silane-Germane Discharge Deposition

A. Gallagher, D. Doughty, J. Doyle, 1989 .

Radical and film growth kinetics in methane radio‐frequency glow discharges

D. J. Dagel, James R. Doyle, D. Dagel, 1996 .

Chemical kinetics in low pressure acetylene radio frequency glow discharges

J. Doyle, 1997 .

Surface hydrogen release during the growth of a‐Si:H by reactive magnetron sputtering

J. Abelson, L. Mandrell, A. M. Myers, 1990 .

A comparative study of interatomic potentials for copper and aluminum gas phase sputter atom transport simulations

J. Doyle, K. Kuwata, Rachel I. Erickson, 2003 .

Effects of substrate temperature and near-substrate plasma density on the properties of dc magnetron sputtered aluminum doped zinc oxide

David Callender, W. Kimes, J. Doyle, 2003 .

Monte Carlo simulations of sputter atom transport in low-pressure sputtering: The effects of interaction potential, sputter distribution, and system geometry

David N Ruzic, James R. Doyle, D. Ruzic, 1992 .

Measurement of deposition rate and ion energy distribution in a pulsed dc magnetron sputtering system using a retarding field analyzer with embedded quartz crystal microbalance.

R. Vijayaraghavan, S. Daniels, D. Gahan, 2016, The Review of scientific instruments.

Monte Carlo simulations of magnetron sputtering particle transport

David N Ruzic, John R Abelson, James R. Doyle, 1991 .

Film stoichiometry and gas dissociation kinetics in hot-wire chemical vapor deposition of a-SiGe:H

R. Reedy, H. Branz, A. Mahan, 2008 .

Development of a Particle-in-Cell/Monte Carlo Simulation for Weakly Ionized Plasmas

J. Doyle, Xiaochuan Zheng, Xiaochuan Chloe, 2023 .