C. Himmel

In-situ prediction of RIE time to completion using neural networks

G. May, D. Baker, C. Himmel, 1994, Proceedings of 16th IEEE/CPMT International Electronic Manufacturing Technology Symposium.

Advantages of plasma etch modeling using neural networks over statistical techniques

Gary S. May, C. D. Himmel, G. May, 1993 .

A comparison of statistically-based and neural network models of plasma etch behavior

Gary S. May, C. D. Himmel, G. May, 1992, [1992 Proceedings] IEEE/SEMI International Semiconductor Manufacturing Science Symposium.