Wei Li

发表

Plasma enhanced CVD of fluorocarbon films by low-pressure dielectric barrier discharge

Zhiqing Feng, Dongping Liu, Jinhai Niu, 2009 .

Ge-doped SiO2 thin films produced by helicon activated reactive evaporation

C. Charles, R. Boswell, J. Love, 2002 .

Ultrahard diamond single crystals from chemical vapor deposition

H. Mao, R. Hemley, Yusheng Zhao, 2004 .

Deep dry-etch of silica in a helicon plasma etcher for optical waveguide fabrication

Barry Luther-Davies, Christine Charles, Roderick Boswell, 2005 .

Effect of pre-Co-deposition C+implantation on the stress level of CoSi2films formed on Si(100) substrates

Junchen Liu, Wei Li, Jianjiang Feng, 2001 .

The effect of defects on the optical nonlinearity of thermally poled SiOx thin films

Wei Li, Anna Samoc, Marek Samoc, 2008 .

Introduction of atomic H into Si3N4/SiO2/Si stacks

A. Blakers, K. Weber, Hao Jin, 2006 .

Significant improvement of adhesion between gold thin films and a polymer

B. Luther-Davies, R. Charters, Wei Li, 2004 .

Reduction of the tensile stress in CoSi2 films by pre-deposition carbon ion implantation

Wei Li, Jifeng Liu, Jianjiang Feng, 2002 .

Metal-Free Catalytic Preparation of Graphene Films on a Silicon Surface Using CO as a Carbon Source in Chemical Vapor Deposition

Zheng-Xian Li, H. Lv, Lintao Liu, 2023, Coatings.