Ayako Endo

Impact of polarization for an attenuated phase-shift mask with ArF hyper-NA lithography

Shoji Mimotogi, Takashi Sato, Satoshi Tanaka, 2004, SPIE Advanced Lithography.

Rigorous simulation of exposure over nonplanar wafers

Takashi Sato, Thomas Schmoeller, Christian K. Kalus, 2003, SPIE Advanced Lithography.

Resist footing variation and compensation over nonplanar wafer

Soichi Inoue, Kohji Hashimoto, Takashi Sato, 2003, SPIE Advanced Lithography.

Approach for reducing resist footing over nonplanar wafer

Soichi Inoue, Shoji Mimotogi, Masafumi Asano, 2004, SPIE Advanced Lithography.

Alignment mark signal simulation system for the optimum mark feature selection

Takashi Sakamoto, Takashi Sato, Satoshi Tanaka, 2004, SPIE Advanced Lithography.

Alignment mark signal simulation system for the optimum mark feature selection

Takashi Sakamoto, Satoshi Tanaka, Kazutaka Ishigo, 2005 .

Impact of polarization on an attenuated phase shift mask with ArF hyper-numerical aperture lithography

Shoji Mimotogi, Ayako Endo, Akiko Mimotogi, 2006 .

Characterization of 45 nm Attenuated Phase Shift Mask Lithography with a Hyper Numerical Aperture ArF Tool

Shoji Mimotogi, Ayako Endo, Akiko Mimotogi, 2006 .