K. Ramaswamy

发表

Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching

Sang-jun Choi, S. Rauf, K. Tokashiki, 2009, IEEE Transactions on Plasma Science.

Characterization of electron beams generated in a high‐voltage pulse‐line‐driven pseudospark discharge

J. Rodgers, W. Destler, Z. Segalov, 1994 .

High power, high brightness electron beam generation in a pulse‐line driven pseudospark discharge

M. Reiser, J. Rodgers, W. Destler, 1993 .

Effects of interelectrode gap on high frequency and very high frequency capacitively coupled plasmas

S. Rauf, K. Bera, K. Collins, 2009 .

Synchronous Pulse Plasma Operation upon Source and Bias Radio Frequencys for Inductively Coupled Plasma for Highly Reliable Gate Etching Technology

Joo-Tae Moon, Woo-Sung Han, Shahid Rauf, 2009 .

Control of plasma uniformity in a capacitive discharge using two very high frequency power sources

S. Rauf, K. Bera, K. Collins, 2009 .

A fundamental mode, high-power, large-orbit gyrotron using a rectangular interaction region

W. W. Destler, D. J. Radack, J. Rodgers, 1993 .

A high‐voltage triggered pseudospark discharge experiment

J. Rodgers, W. Destler, K. Ramaswamy, 1996 .

Microwave generation in a high voltage triggered pseudospark discharge experiment

J. Rodgers, W. Destler, K. Ramaswamy, 1998 .

High power high brightness electron beam generation in a pulse-line driven pseudospark discharge

J. Rodgers, Matthias Reiser, Z. Segalov, 1993, Proceedings of International Conference on Particle Accelerators.

Assignment of Axial Wavenumber in a Plasma Absorption Probe

Satoru Kobayashi, K. Ramaswamy, 2007 .

High Power Fundamental Mode Large-orbit Gyrotron Experiment

J. Rodgers, K. Ramaswamy, W.W. Destler, 1991, IEEE Conference Record - Abstracts. 1991 IEEE International Conference on Plasma Science.

Etching with atomic precision by using low electron temperature plasma

Shahid Rauf, Ankur Agarwal, Kenneth S. Collins, 2017 .