K. Hirobe

The Effect of Charge Build-up on Gate Oxide Breakdown during Dry Etching

K. Nojiri, K. Tsunokuni, Sumi Kuboshima, 1987 .

Reduction of Radiation Damage on Silicon Substrates in Magnetron Reactive Ion Etching

K. Hirobe, H. Azuma, 1985 .

End Point Detection in Plasma Etching by Optical Emission Spectroscopy

T. Tsuchimoto, K. Hirobe, 1980 .

Formation of deep holes in silicon by reactive ion etching

K. Nojiri, K. Hirobe, Koichi Kawamura, 1987 .

Some Problems in Plasma Etching of Al and Al‐Si Alloy Films

T. Tsuchimoto, K. Hirobe, Yoshinori Kureishi, 1981 .