Alexander Kremer

Towards 22 nm: fast and effective intra-field monitoring and optimization of process windows and CDU

Jo Finders, Huixiong Dai, Shmoolik Mangan, 2011, Advanced Lithography.

Toward 22 nm: fast and effective intrafield monitoring and optimization of process windows and critical dimension uniformity

Jo Finders, Huixiong Dai, Chris Ngai, 2011 .

A Methodology for Consideration of Uncertainty in Lifetime Design of Experiments

Bernd Bertsche, Alexander Kremer, B. Bertsche, 2019, 2019 Annual Reliability and Maintainability Symposium (RAMS).

Regression with individual weigths to prevent overfitting

Bernd Bertsche, Alexander Kremer, Mark Henss, 2019 .