Kyunghwa Sohn

Electro-optical characteristics of a chiral hybrid in-plane switching liquid crystal mode for high brightness.

J. Gwag, Jae-Hoon Kim, Young-Ki Kim, 2008, Optics express.

Triphenylsulfonium salt methacrylate bound polymer resist for electron beam lithography

Ki-Bum Kim, Haiwon Lee, Hyun-Mi Kim, 2014 .

Enhanced Acid Diffusion Control by Using Photoacid Generator Bound Polymer Resist.

Haiwon Lee, Jin-Hyuck Jung, Kyunghwa Sohn, 2015, Journal of nanoscience and nanotechnology.

Synthesis of novel photoacid generator containing resist polymer for electron beam lithography.

Haiwon Lee, Kyunghwa Sohn, Min Jeong Kim, 2012, Journal of nanoscience and nanotechnology.