Ryoich Hirano

Mask Inspection Technology for 65nm (hp) Technology Node and Beyond

Nobuyuki Yoshioka, Tsuneo Terasawa, Dong-Hoon Chung, 2005 .

Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance

Nobuyuki Yoshioka, Ikunao Isomura, Takeshi Nishizaka, 2004, SPIE Photomask Technology.