Guojie Cheng

发表

Yield impacting systematic defects search and management

Xing Zhao, Jing Zhang, Qingxiu Xu, 2012, Advanced Lithography.

Simulation based mask defect repair verification and disposition

Ling Li, Guojie Cheng, Abhishek Vikram, 2009, Photomask Technology.

Enhanced photomask quality control by 2D structures monitoring using auto image-to-layout method on advanced 28nm technology node or beyond

Guojie Cheng, Shijie Chen, Irene Shi, 2013, Advanced Lithography.

Novel pattern-centric solution for high performance 3D NAND VIA dishing metrology

Liming Zhang, Jian Mi, Guojie Cheng, 2019, Advanced Lithography.

Detection of OPC conflict edges through MEEF analysis

Guojie Cheng, Gary Zhang, Abhishek Vikram, 2010, Advanced Lithography.

Pattern centric design based sensitive patterns and process monitor in manufacturing

Guojie Cheng, Chingyun Hsiang, Kechih Wu, 2017, Advanced Lithography.

Pattern centric OPC flow: a special RET flow with fast turn-around-time

Qingwei Liu, Guojie Cheng, Gary Zhang, 2008, SPIE Advanced Lithography.

Simulation based mask defect printability verification and disposition, part II

Nancy Fan, Li Ling, Guojie Cheng, 2011, Photomask Technology.

An advanced and efficient methodology for process setup and monitoring by using process stability diagnosis in computational lithography

Guojie Cheng, Abhishek Vikram, Hui Wang, 2020 .

Automatically high accurate and efficient photomask defects management solution for advanced lithography manufacture

Jun Zhu, Wei Jiang, Li Ling, 2014, Advanced Lithography.

Pattern-centric yield management approach with machine learning to detect and track defects with full chip coverage

Guojie Cheng, Gary Zhang, Abhishek Vikram, 2021 .