Abhishek Vikram

发表

Yield impacting systematic defects search and management

Xing Zhao, Jing Zhang, Qingxiu Xu, 2012, Advanced Lithography.

Simulation based mask defect repair verification and disposition

Ling Li, Guojie Cheng, Abhishek Vikram, 2009, Photomask Technology.

Multiple-patterning and systematic wafer inspection of VLSI devices for yield

Abhishek Vikram, Vineeta Agarwal, Dharmendra Prakash, 2015, 2015 Annual IEEE India Conference (INDICON).

Overview of nano-electronics printing techniques and patterning defects detection

Abhishek Vikram, Vineeta Agarwal, Dharmendra Praksash, 2015, 2015 IEEE UP Section Conference on Electrical Computer and Electronics (UPCON).

Patterning Defect Study for Process Integration Engineering Using Pattern Fidelity Monitoring with Review SEM Images

Yu Zhang, Gary Zhang, Abhishek Vikram, 2019 .

Critical defect detection, monitoring and fix through process integration engineering by using D2DB pattern monitor solution

Baojun Zhao, Yu Zhang, Gary Zhang, 2019, Advanced Lithography.

Critical Review of Current Trends in ASIC Writing and Layout Analysis

Abhishek Vikram, Vineeta Agarwal, 2016 .

Applying reconfigurable RET across process window to create more robust manufacturing designs

Abhishek Vikram, Gaurav Verma, Hong Du, 2005, SPIE Photomask Technology.

Detection of OPC conflict edges through MEEF analysis

Guojie Cheng, Gary Zhang, Abhishek Vikram, 2010, Advanced Lithography.

Hot spot management through design based metrology: measurement and filtering

Akio Ishikawa, Donggyu Yim, Sungki Park, 2009, Lithography Asia.

OPC verification and hotspot management for yield enhancement through layout analysis

Donggyu Yim, Sungki Park, Abhishek Vikram, 2011, Advanced Lithography.

Inspection of integrated circuit database through reticle and wafer simulation: the lithography process window performance monitoring

Abhishek Vikram, Hong Du, Gaurav Verma, 2005, SPIE Photomask Technology.

An advanced and efficient methodology for process setup and monitoring by using process stability diagnosis in computational lithography

Guojie Cheng, Abhishek Vikram, Hui Wang, 2020 .

Patterning approach for detecting defect in device manufacturing

Abhishek Vikram, Vineeta Agarwal, 2017 .

Inspection of high-aspect ratio layers at sub 20nm node

Abhishek Vikram, Frank Jin, Sumanth Kini, 2013, Advanced Lithography.

Pattern-centric yield management approach with machine learning to detect and track defects with full chip coverage

Guojie Cheng, Gary Zhang, Abhishek Vikram, 2021 .