Akira Sumitani

发表

Characterization of various Sn targets with respect to debris and fast ion generation

Koichi Toyoda, Yoshifumi Ueno, Hideo Hoshino, 2007, SPIE Advanced Lithography.

Evaluation at the intermediate focus for EUV light source

Georg Soumagne, Akira Endo, Akira Sumitani, 2009, Advanced Lithography.

LPP EUV light source employing high power C02 laser

Akira Endo, Akira Sumitani, Hideo Hoshino, 2008, SPIE Advanced Lithography.

1-kHz 5-W ArF excimer laser for microlithography with highly narrow 0.7-pm bandwidth and issues on durability related to optical damage

Hakaru Mizoguchi, Akira Sumitani, Toru Suzuki, 1999, Laser Damage.

Development of the reliable 20 kW class pulsed carbon dioxide laser system for LPP EUV light source

Akira Sumitani, Takashi Suganuma, Junichi Fujimoto, 2011, Advanced Lithography.

Noise and Vibration Reduction Technology for the Latest Diesel Engine

Hiroshi Abe, Akira Sumitani, Naotoshi Shirahashi, 2013 .

Development of high-power ArF/F2 laser platform for VUV microlithography

Tatsuya Ariga, Hakaru Mizoguchi, Akira Sumitani, 2004, SPIE Advanced Lithography.

Highly durable 4-kHz ArF excimer laser G42A for sub-90-nm lithography

Hakaru Mizoguchi, Akira Sumitani, Hitoshi Tomaru, 2004, SPIE Advanced Lithography.

Magnetic field for efficient exhaustion of CO2 laser-produced Sn plasma in EUV light source

Hiroshi Komori, Georg Soumagne, Akira Endo, 2008, High-Power Laser Ablation.

Development of environmental control technologies for 157-nm lithography at ASET

Seiji Takeuchi, Akira Sumitani, Kiyoharu Nakao, 2002, SPIE Advanced Lithography.

First generation laser-produced plasma source system for HVM EUV lithography

Hiroshi Komori, Akira Sumitani, Tamotsu Abe, 2010, Advanced Lithography.

Evaluation systems of F2 laser lithography materials

Akira Sumitani, Toshiro Itani, Yasuo Itakura, 2004, SPIE Advanced Lithography.

Performance of a highly stable 2-kHz operation KrF laser

Tatsuya Ariga, Masaki Nakano, Akira Sumitani, 1999, Advanced Lithography.

High-repetition-rate ArF excimer laser for microlithography

Akira Sumitani, Osamu Wakabayashi, Yasuo Itakura, 2000, International Symposium on Laser Precision Microfabrication.

Present status of development of gas-purging and chemically clean technologies at ASET

Seiji Takeuchi, Akira Sumitani, Kiyoharu Nakao, 2001, SPIE Advanced Lithography.

Efficient and compact short pulse MOPA system for laser-produced-plasma extreme-UV sources employing RF-discharge slab-waveguide CO2 amplifiers

Akira Endo, Akira Sumitani, Takashi Suganuma, 2008, High-Power Laser Ablation.

Beam quality of a new-type MOPO laser system for VUV laser lithography

Tatsuya Ariga, Hakaru Mizoguchi, Akira Sumitani, 2004, SPIE Advanced Lithography.

Study of resist outgassing by F2 laser irradiation

Akira Sumitani, Toshiro Itani, Seiichi Ishikawa, 2003, SPIE Advanced Lithography.

Liquid immersion lithography at 157 nm

Akira Sumitani, Yasuo Itakura, Takuya Hagiwara, 2004, SPIE Advanced Lithography.

Characterization of tin vapor from CO2 laser produced EUV light source

Akira Sumitani, Takashi Suganuma, Hiroshi Komori, 2009, Optics + Optoelectronics.

CO2 laser-produced Sn plasma as the solution for high-volume manufacturing EUV lithography

Koichi Toyoda, Hideo Hoshino, Masaki Nakano, 2007, SPIE Optical Engineering + Applications.

Development of CO2 laser produced Xe plasma EUV light source for microlithography

Koichi Toyoda, Hideo Hoshino, Tatsuya Ariga, 2006, SPIE Advanced Lithography.

Evaluation of characteristics of VUV optical materials irradiated by F2 laser

Hakaru Mizoguchi, Akira Sumitani, Yasuo Itakura, 2001, SPIE Advanced Lithography.

Small field exposure tool (SFET) light source

Georg Soumagne, Akira Sumitani, Takashi Suganuma, 2007, SPIE Advanced Lithography.

Evaluation of outgassing from a fluorinated resist for 157-nm lithography

Akira Sumitani, Toshiro Itani, Yasuo Itakura, 2004, SPIE Advanced Lithography.

In-situ measurement of VUV optical materials under F2 laser irradiation

Hakaru Mizoguchi, Akira Sumitani, Yasuo Itakura, 2002, International Symposium on Laser Precision Microfabrication.

Highly durable low CoO mass production version of 2-kHz ArF excimer laser for DUV lithography

Hakaru Mizoguchi, Akira Sumitani, Toru Suzuki, 2000, Advanced Lithography.

Feasibility study of 6 kHz ArF excimer laser for 193 nm immersion lithography

Akira Sumitani, Osamu Wakabayashi, Hakaru Mizoguchi, 2004, SPIE Advanced Lithography.

KrF laser driven xenon plasma light source of a small-field exposure tool

Georg Soumagne, Hakaru Mizoguchi, Akira Sumitani, 2006, SPIE Advanced Lithography.

100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Georg Soumagne, Akira Sumitani, Takashi Suganuma, 2011, Advanced Lithography.

Sub-40nm pattern fabrication in 157nm interferometric immersion lithography

Akira Sumitani, Masato Moriya, Takuya Hagiwara, 2006, SPIE Advanced Lithography.

In-situ measurements of VUV optical materials for F2 laser

Akira Sumitani, Toshiro Itani, Yasuo Itakura, 2002, SPIE Advanced Lithography.

Magnetic debris mitigation of a CO2 laser-produced Sn plasma

Akira Sumitani, Takashi Suganuma, Masato Moriya, 2008, SPIE Advanced Lithography.

Development and evaluation of an F2 laser for immersion interference lithography at 157nm

Shinji Nagai, Akira Sumitani, Masato Moriya, 2004, SPIE Advanced Lithography.

Evaluation of characteristics of VUV optical materials irradiated by F2 laser

Hakaru Mizoguchi, Akira Sumitani, Osamu Wakabayashi, 2000, International Symposium on Laser Precision Microfabrication.

Sn droplet target development for laser produced plasma EUV light source

Masaki Nakano, Georg Soumagne, Akira Endo, 2008, SPIE Advanced Lithography.

Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation

Hakaru Mizoguchi, Akira Sumitani, Junichi Fujimoto, 2003, SPIE Advanced Lithography.

CO2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography

Koichi Toyoda, Hideo Hoshino, Masaki Nakano, 2008, SPIE Advanced Lithography.

Billion-level durable ArF excimer laser with highly stable energy

Hakaru Mizoguchi, Akira Sumitani, Toru Suzuki, 1999, Advanced Lithography.

QCL seeded, ns-pulse, multi-line, CO2 laser oscillator for laser-produced-plasma extreme-UV source

Akira Endo, Hakaru Mizoguchi, Akira Sumitani, 2017, International Symposium on High Power Laser Systems and Applications.

Effects of Design Parameters on Root Stresses of Thin-Rimmed Helical Internal Gears with Asymmetric Web Arrangement in Mesh.

Satoshi Oda, Akira Sumitani, Kouitsu Miyachika, 1997 .

Present status of laser-produced plasma EUV light source

Masaki Nakano, Akira Sumitani, Tamotsu Abe, 2010, Advanced Lithography.

Characterization and optimization of tin particle mitigation and EUV conversion efficiency in a laser produced plasma EUV light source

Georg Soumagne, Akira Endo, Akira Sumitani, 2011, Advanced Lithography.

Output stabilization technology with chemical impurity control on ArF excimer laser

Hakaru Mizoguchi, Akira Sumitani, Natsushi Suzuki, 2000, Advanced Lithography.

Laser produced EUV light source development for HVM

Koichi Toyoda, Hideo Hoshino, Tatsuya Ariga, 2007, SPIE Advanced Lithography.

Reduction of debris of a CO2 laser-produced Sn plasma extreme ultraviolet source using a magnetic field

Georg Soumagne, Akira Sumitani, Takeshi Higashiguchi, 2008 .

CO2 laser drives extreme ultraviolet nano-lithography — second life of mature laser technology

Akira Sumitani, Takashi Suganuma, Junichi Fujimoto, 2013 .

Efficient multiline nanosecond pulse amplification in planar waveguide CO₂ amplifier for extreme UV laser-produced plasma source.

Akira Sumitani, Takashi Suganuma, Junichi Fujimoto, 2014, Optics letters.

Enhancement of extreme ultraviolet emission from a CO2 laser-produced Sn plasma using a cavity target

Georg Soumagne, Akira Sumitani, Takeshi Higashiguchi, 2007 .

Production of laser-heated plasma in high- pressure Ar gas and emission characteristics of vacuum ultraviolet radiation from Ar2 excimers

Akira Sumitani, Mitsuo Maeda, Toshihiro Nishisaka, 2002 .

Performance Improvement of an ArF Excimer Laser for Microlithography by Means of Gaseous Impurity Control

Akira Sumitani, Takanobu Ishihara, Kiichiro Uchino, 2005 .