P. K. Vasudev

发表

Thin electroless barrier for copper films

Sergey D. Lopatin, Yosi Y. Shacham-Diamand, Valery M. Dubin, 1998, Advanced Lithography.

Automatic proximity correction for 0.35 /spl mu/m I-line photolithography

Joseph G. Garofalo, Oberdan W. Otto, Chi-Min Yuan, 1994, Proceedings of International Workshop on Numerical Modeling of processes and Devices for Integrated Circuits: NUPAD V.

Automated optical proximity correction: a rules-based approach

Christophe Pierrat, Sheila Vaidya, Joseph G. Garofalo, 1994, Advanced Lithography.

Electroless Cu and barrier layers for subhalf-micron multilevel interconnects

Yosef Y. Shacham-Diamand, Sergey D. Lopatin, Valery M. Dubin, 1997, Advanced Lithography.

CMOS device and interconnect technology enhancements for low power/low voltage applications

P. K. Vasudev, 1996 .

Characterization of low dose SIMOX for low power electronics

Xiaoyu Shi, M. J. Anc, R. P. Dolan, 1996, 1996 IEEE International SOI Conference Proceedings.

Strip-plot design for two-step processes

Xiaoyu Shi, George A. Milliken, P. K. Vasudev, 1998 .

Si-ULSI with a scaled down future

P. K. Vasudev, P. Vasudev, P. Zeitzoff, 1998 .

Solid Phase Epitaxial Recrystallization of Sos, with Applications to Submicrometer Cmos and Bipolar Devices

P. K. Vasudev, 1985 .

Two-dimensional analytic modeling of very thin SOI MOSFETs

Jason C. S. Woo, P. K. Vasudev, J. Woo, 1990 .

Reliability and electrical properties of new low dielectric constant interlevel dielectrics for high performance ULSI interconnect

P. K. Vasudev, Thomas E. Seidel, T. Seidel, 1996, Proceedings of International Reliability Physics Symposium.

A High Performance Submicrometer CMOS/SOI Technology Using Ultrathin Silicon Films on Simox

P. K. Vasudev, K. W. Terrill, S. Seymour, 1987 .

Low temperature and low cost planarised aluminium interconnect for sub-half micrometre VLSI circuits

P. K. Vasudev, V. Hoffman, T. E. Seidel, 1997 .

Two-dimensional analytic modeling of very thin SOI MOSFETs

Jason C. S. Woo, P. K. Vasudev, K. W. Terrill, 1989, IEEE SOS/SOI Technology Conference.

Chromium concentrations, depth distributions, and diffusion coefficient in bulk and epitaxial GaAs and in Si

P. K. Vasudev, R. G. Wilson, V. Deline, 1980 .

Design and performance of submicron MOSFETs on ultra-thin SOI for room temperature and cryogenic operation

Jason C. S. Woo, P. K. Vasudev, K. Terrill, 1988, Technical Digest., International Electron Devices Meeting.

Selective and Blanket Electroless Copper Deposition for Ultralarge Scale Integration.

Valery M. Dubin, P. K. Vasudev, Bin Zhao, 1997 .