Kohei Shioda

Non-Heat Assistance Plasma-Enhanced Chemical Vapor Deposition of SiCxNyOzFilm Using Monomethylsilane, Nitrogen and Argon

Hitoshi Habuka, Toru Watanabe, M. Minh, 2017 .

High Temperature SiC Reactor Cleaning Using Chlorine Trifluoride Gas Achieved by Purified Pyrolytic Carbon Coating Film

Hitoshi Habuka, Hideki Ito, Keisuke Kurashima, 2019, Materials Science Forum.

Yttrium oxide film for protecting quartz glass surface from etching by long-term exposure to chlorine trifluoride gas at room temperature

Hitoshi Habuka, Keisuke Kurashima, Kohei Shioda, 2018, Materials Science in Semiconductor Processing.

Quick and Practical Cleaning Process for Silicon Carbide Epitaxial Reactor

Hitoshi Habuka, Hideki Ito, Keisuke Kurashima, 2018, Materials Science Forum.

Quick Cleaning Process for Silicon Carbide Chemical Vapor Deposition Reactor

Hitoshi Habuka, Hideki Ito, Keisuke Kurashima, 2017 .

Susceptor Coating Materials Applicable for SiC Reactor Cleaning

Hitoshi Habuka, Hideki Ito, Yoshinao Takahashi, 2016, 2016 European Conference on Silicon Carbide & Related Materials (ECSCRM).

Repetition of In Situ Cleaning Using Chlorine Trifluoride Gas for Silicon Carbide Epitaxial Reactor

Hitoshi Habuka, Y. Ishida, Kosuke Mizuno, 2016 .

Room Temperature and Reduced Pressure Chemical Vapor Deposition of Silicon Carbide on Various Materials Surface

Hitoshi Habuka, M. Tsuji, Kohei Shioda, 2014 .