Daisuke Totsukawa

Surface energy control techniques for photomask fabrication and their characterizations with scanning probe microscopy

Makoto Abe, Yasutaka Morikawa, Naoya Hayashi, 2008, Photomask Japan.

Adhesion control between resist patterns and photomask blank surfaces

Yasutaka Morikawa, Morihisa Hoga, Naoya Hayashi, 2009, Photomask Japan.

Influence of the baking process for chemically amplified resist on CD performance

Naoya Hayashi, Takeshi Ohfuji, Shiho Sasaki, 2002, Photomask Technology.