Tom Donnelly

发表

Phase aware proximity correction for advanced masks

Franklin M. Schellenberg, Yuri Granik, Patrick Schiavone, 2000, Advanced Lithography.

Minimizing yield-loss risks through post-OPC verification

Ching-Heng Wang, Qingwei Liu, Shumay Shang, 2006, SPIE Photomask Technology.

Application of mask process correction (MPC) to monitor and correct mask process drift

Sunwook Jung, Tom Donnelly, Timothy Lin, 2011, Advanced Lithography.

Book Review: British Car Factories from 1896

Tom Donnelly, 1994 .

Rover-BMW: study in merger failure

Tom Donnelly, David R. Morris, 2002 .

Making Cars at Cowleys: From Morris to Rover

Tom Donnelly, 2000 .

The motor car industry in Coventry since the 1890's : [origins, development and structure]

Tom Donnelly, David Thoms, 1985 .

Model based mask process correction and verification for advanced process nodes

Steffen Schulze, Timothy Lin, Tom Donnelly, 2009, Advanced Lithography.

The Coventry Motor-Car Industry: Parameters and Significance

Tom Donnelly, David Thoms, 2017 .

Anaerobic treatment of a chemical synthesis-based pharmaceutical wastewater in a hybrid upflow anaerobic sludge blanket reactor.

Tom Donnelly, Orhan Ince, Paul Sallis, 2008, Bioresource technology.