Danping Peng

发表

EUV mask absorber and multi-layer defect disposition techniques using computational lithography

Masaki Satake, Vikram Tolani, David Kim, 2011, Photomask Technology.

Computational lithography and inspection (CLI) and its applications in mask inspection, metrology, review, and repair

Vikram Tolani, Linyong Pang, Danping Peng, 2010, Photomask Technology.

EUV multilayer defect compensation (MDC) by absorber pattern modification: from theory to wafer validation

Masaki Satake, Vikram Tolani, Linyong Pang, 2011, Photomask Technology.

Computational mask defect review for contamination and haze inspections

Daniel Price, Paul A. Morgan, Daniel Rost, 2013, Photomask Technology.

Mask Pattern Recovery Using Level Set Method and its Application on Defect Auto Disposition based on Simulated Aerial/Wafer Image

David Kim, Vikram Tolani, Jinhyung Park, 2009 .

Defect printability studies at SEMATECH

Sungmin Huh, Vibhu Jindal, Ranganath Teki, 2013, Photomask and Next Generation Lithography Mask Technology.

Automated Defect Classification (ADC) and Progression Monitoring (DPM) in wafer fab reticle requalification

Vikram Tolani, Bill Wang, Peter Hu, 2013, Photomask Technology.

EUV multilayer defect compensation (MDC): latest progress on model and compensation methods

Masaki Satake, Vikram Tolani, Linyong Pang, 2013, Photomask Technology.

EUV multilayer defect compensation (MDC) by absorber pattern modification: improved performance with deposited material and other progresses

Ying Li, Masaki Satake, Vikram Tolani, 2012, Photomask Technology.

Lithographic plane review (LPR) for sub-32nm mask defect disposition

Vikram Tolani, Linyong Pang, Noel Corcoran, 2010, Photomask Technology.

Validation of inverse lithography technology (ILT) and its adaptive SRAF at advanced technology nodes

Ki-Ho Baik, Ying Cui, Linyong Pang, 2008, SPIE Advanced Lithography.

EUV multilayer defect compensation (MDC) by absorber pattern modification, film deposition, and multilayer peeling techniques

Ying Li, Masaki Satake, Vikram Tolani, 2013, Advanced Lithography.

Compensation for EUV multilayer defects within arbitrary layouts by absorber pattern modification

Ying Li, Masaki Satake, Vikram Tolani, 2011, Advanced Lithography.

In-situ repair qualification by applying Computational Metrology and Inspection (CMI) technologies

Bo Su, Masaki Satake, Linyong Pang, 2013, Photomask and Next Generation Lithography Mask Technology.

Source-mask co-optimization (SMO) using level set methods

Vikram Tolani, Bob Gleason, Linyong Pang, 2009, Photomask Technology.

Computational inspection applied to a mask inspection system with advanced aerial imaging capability

Vikram Tolani, Thuc Dam, Linyong Pang, 2010, Advanced Lithography.

Computational defect review for wafer-fab reticle requal, part 1: mask plane inspections

Ying Li, Vikram Tolani, Linyong Pang, 2012, Photomask Technology.

Computational defect review for actinic mask inspections

Paul A. Morgan, Daniel Rost, Masaki Satake, 2013, Advanced Lithography.

Defect printability comparing actinic printing with advanced simulation for EUV masks

Sungmin Huh, Vibhu Jindal, Ranganath Teki, 2013, Advanced Lithography.

Bridging the gaps between mask inspection/review systems and actual wafer printability using computational metrology and inspection (CMI) technologies

Masaki Satake, Vikram Tolani, Linyong Pang, 2012, Photomask Technology.

Efficiency and throughput improvement on defect disposition through automated defect classification

Paul Yu, Vikram Tolani, Noel Corcoran, 2011, Photomask Technology.

From Computational Lithography to Computational Inspection: Inverse Lithography Technology (ILT) and Inverse Inspection Technology (IIT)

Ki-Ho Baik, Vikram Tolani, Guangming Xiao, 2010 .

Toward a consistent and accurate approach to modeling projection optics

Vikram Tolani, Thuc Dam, Danping Peng, 2010, Advanced Lithography.

AIMS D2DB simulation for DUV and EUV mask inspection

Ying Li, Masaki Satake, Peter Hu, 2012, European Mask and Lithography Conference.

Mask pattern recovery by level set method based inverse inspection technology (IIT) and its application on defect auto disposition

David Kim, Ki-Ho Baik, Vikram Tolani, 2009, Photomask Technology.

Expanding the applications of computational lithography and inspection (CLI) in mask inspection, metrology, review, and repair

Ying Li, Vikram Tolani, Linyong Pang, 2011, Advanced Lithography.

Weighted ENO Schemes for Hamilton-Jacobi Equations

Danping Peng, Guang-Shan Jiang, Guang-Shan Jiang, 1999, SIAM J. Sci. Comput..

Computational inspection applied to a mask inspection system with advanced aerial imaging capability

Vikram Tolani, Linyong Pang, Thuc Dam, 2010, Photomask Japan.

Source mask optimization (SMO) at full chip scale using inverse lithography technology (ILT) based on level set methods

Vikram Tolani, Guangming Xiao, Bob Gleason, 2009, Lithography Asia.

Optimization from design rules, source and mask, to full chip with a single computational lithography framework: level-set-methods-based inverse lithography technology (ILT)

Vikram Tolani, Guangming Xiao, Bob Gleason, 2010, Advanced Lithography.

Advancement of fast EUV lithography modeling/simulations and applications on evaluating different repair options for EUV mask multilayer defect

Masaki Satake, Linyong Pang, Peter Hu, 2013, Photomask Technology.

A fast approach to model EUV mask 3D and shadowing effects

Masaki Satake, Peter Hu, Ying Li, 2012, European Mask and Lithography Conference.

Mask defect auto disposition based on aerial image in mask product

Jin Sun, Linyong Pang, Laurent C. Tuo, 2009, Photomask Japan.

Validation and application of a mask model for inverse lithography

Thuc H. Dam, Bob Gleason, Xin Zhou, 2008, SPIE Advanced Lithography.

Compensation methods using a new model for buried defects in extreme ultraviolet lithography masks

Ying Li, Andrew R. Neureuther, Linyong Pang, 2010, Photomask Technology.

Level-Set-Based Deformation Methods for Adaptive Grids

Stanley Osher, Guojun Liao, Danping Peng, 2000 .

Computational metrology and inspection (CMI) in mask inspection, metrology, review, and repair

Ying Li, Masaki Satake, Vikram Tolani, 2012 .