Hideo Horibe

发表

Scanning removal of ion-implanted novolak resist by using a laser irradiation

Hiroyuki Kuramae, Tomosumi Kamimura, Takashi Nishiyama, 2014, Other Conferences.

Study of the lithography characteristics of novolak resist at different PAC concentrations

Atsushi Sekiguchi, Hatsuyuki Tanaka, Hideo Horibe, 2012, Other Conferences.

Effect of dissolution inhibitors on the dissolution characteristics of chemically amplified positive-tone electron beam resist

Shigeru Kubota, Teruhiko Kumada, Hideo Horibe, 1995, Advanced Lithography.

Raman microspectroscopic study on an optically formed poly(N-isopropylacrylamide) rich microparticle: molecular weight dependence of a polymer concentration in the particle

Tatsuya Shoji, Yasuyuki Tsuboi, Mitsuhiro Matsumoto, 2018, Other Conferences.

An Inquiry into Reading Comprehension Strategies through Think-aloud Protocols

Hideo Horibe, 1995 .

Enhancement of surface damage resistance by selective chemical removal of CeO2

Takahisa Jitsuno, Kunio Yoshida, Shinji Motokoshi, 2005, SPIE Laser Damage.

Laser removal of positive-tone diazonaphthoquinone / novolak resist without occurring laser-induced damage to the silicon wafer

Tomosumi Kamimura, Hiroki Muraoka, Hideo Horibe, 2012, Laser Damage.

Substrate Temperature Dependence of the Photoresist Removal Rate Using Atomic Hydrogen Generated by a Hot-Wire Tungsten Catalyst

Masashi Yamamoto, Hideo Horibe, Akihiko Kono, 2010 .

Enhancement of Surface-Damage Resistance by Removing Subsurface Damage in Fused Silica and Its Dependence on Wavelength

Takahisa Jitsuno, Shinji Motokoshi, Kunio Yoshida, 2004 .

Stripping of the Positive-tone Diazonaphthoquinone / Novolak Resist using Laser Irradiation from Visible to Near Infrared Wavelength

Hideo Horibe, Tomosumi Kamimura, Yuki Yamana, 2012 .

Photo-resist Removal using Highly Concentrated Ozone Gas-Removal Characteristics of Various Resists-

Masashi Yamamoto, Hideo Horibe, Toshinori Miura, 2008 .

Dismantlable adhesion properties of reactive acrylic copolymers resulting from cross-linking and gas evolution

Hideo Horibe, Eriko Sato, H. Horibe, 2017 .

Removal of Ion-Implanted Photoresists Using Atomic Hydrogen

Seiichi Tagawa, Masashi Yamamoto, Eiji Kusano, 2010 .

Development of a Photoresist Removal Method Using Ozone Gas with Water Vapor for LCD Manufacturing

Hideo Horibe, Makoto Miyamoto, Masaki Kuzumoto, 2003 .

Removal Characteristics of Resists Having Different Chemical Structures by Using Ozone and Water

Seiichi Tagawa, Masashi Yamamoto, Hideo Horibe, 2009 .

Development of a Method for Resist Removal by Ozone with Acetic Acid Vapor

Hideo Horibe, Masaki Kuzumoto, H. Horibe, 2005 .

Resist Removal by Using Wet Ozone

Seiichi Tagawa, Masashi Yamamoto, Hideo Horibe, 2007 .

Electrical Conductivity of Polymer Composites Filled with Metal

Kunio Yoshida, Hideo Horibe, Tomosumi Kamimura, 2005 .

Novel Plasmaless Photoresist Removal Method in Gas Phase at Room Temperature

Masashi Yamamoto, Hideo Horibe, Hironobu Umemoto, 2009 .

Removal of Diazonaphthoquinone/Novolak Resist Using UV Laser (266 nm)

Masashi Yamamoto, Masayuki Fujita, Ichiro Yamato, 2005 .

Removal of Polymers with Various Chemical Structures using Wet Ozone

Seiichi Tagawa, Masashi Yamamoto, Hideo Horibe, 2010 .

Removal of Positive-tone Diazonaphthoquinone/Novolak Resist Using UV Laser Irradiation

Kunio Yoshida, Hideo Horibe, Tomosumi Kamiura, 2005 .

Electrical Conductivity of Polymer Composites Filled with Carbon Black

Kunio Yoshida, Hideo Horibe, Tomosumi Kamimura, 2005 .

Standing-wave effect in photoresist with and without HMDS

Seiichi Tagawa, Atsushi Sekiguchi, Masashi Yamamoto, 2008 .

Resist Removal by using Atomic Hydrogen

Seiichi Tagawa, Masashi Yamamoto, Eiji Kusano, 2008 .

Novolak Resist Removal by Laser Irradiation (532 nm) and Adhesion between Resist and Substrate

Masayuki Fujita, Hideo Horibe, Akira Yoshikado, 2005 .