I. Nakamichi

The Effect of Thermal Oxidation of Silicon on Boron Diffusion in Extrinsic Conditions

Y. Ishikawa, S. Matsumoto, T. Niimi, 1987 .

The Enhanced Diffusion of Low-Concentration Phosphorus, Arsenic and Boron in Silicon during IR-Heating

Y. Ishikawa, I. Nakamichi, Kazuyuki Yamauchi, 1989 .

Effect of Substrate Material on Growth of Bi-Fe-Oxide Films by Reactive Ion Beam Sputtering

H. Yamamoto, T. Okuda, I. Nakamichi, 1990, IEEE Translation Journal on Magnetics in Japan.

Low-Temperature Thermal Oxidation of Silicon in N2O by UV-Irradiation

Yutaka Ishikawa, Yukio Takagi, Y. Ishikawa, 1989 .