Anton DeVilliers

Multi-color fly-cut-SAQP for reduced process variation

Richard A. Farrell, Peter Biolsi, David Hetzer, 2018, Advanced Lithography.

LER improvement for sub-32nm pitch self-aligned quadruple patterning (SAQP) at back end of line (BEOL)

Akiteru Ko, Peter Biolsi, Lei Sun, 2016, SPIE Advanced Lithography.

Manufacturability considerations for DSA

Richard A. Farrell, Nihar Mohanty, Kaushik Kumar, 2014, Advanced Lithography.

Predicting resist sensitivity to chemical flare effects though use of exposure density gradient method

Anton DeVilliers, Michael Hyatt, Kaveri Jain, 2011, Advanced Lithography.