Peter Kuschnerus

Actinic aerial image measurement tool for 157-nm mask qualification

Iwao Higashikawa, Takashi Yasui, Axel Zibold, 2003, Photomask Japan.

Performance of the aerial image measurement system for 157-nm lithography

Wolfgang Harnisch, Axel Zibold, Peter Kuschnerus, 2003, European Mask and Lithography Conference.

Microscope illumination systems for 157 nm

Robert Brunner, Arnaud Deparnay, Alexander Pesch, 2003, SPIE Advanced Lithography.

Application data of the electron beam based photomask repair tool MeRiT MG

Christian Ehrlich, Klaus Edinger, Volker Boegli, 2005, Other Conferences.

Aerial image measurement system for 157nm lithography masks

Axel Zibold, Peter Kuschnerus, Thomas Engel, 2003 .

Aerial Image Measurement System for 157 nm Lithography

Iwao Higashikawa, Takashi Yasui, Axel Zibold, 2002, Photomask Technology.

Actinic aerial image measurement tool for 157-nm lithography

Iwao Higashikawa, Takashi Yasui, Axel Zibold, 2003, Photomask Japan.

Actinic aerial image measurement for qualification of defect on 157-nm photomask

Wolfgang Degel, Iwao Higashikawa, Axel M. Zibold, 2004, Photomask Japan.

Electron-beam-based photomask repair

Hans W. P. Koops, Petra Spies, Klaus Edinger, 2004 .