A. L. Shoe

Second generation fluids for 193nm immersion lithography

Sheng Peng, Roger H. French, Weiming Qiu, 2006, SPIE Advanced Lithography.

High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches

M. F. Lemon, A. L. Shoe, R. H. French, 2007, SPIE Advanced Lithography.

Nitro‐substituted iron(II) tridentate bis(imino)pyridine complexes as high‐temperature catalysts for the production of α‐olefins

A. L. Shoe, A. Ionkin, W. Marshall, 2006 .