Matthew A. Thompson

A symmetric Vss cross-under bitcell technology for 64 Mb SRAMs

James R. Pfiester, S. D. Hayden, Matthew A. Thompson, 1994, Proceedings of 1994 IEEE International Electron Devices Meeting.

Copper metallization for on-chip interconnects

Bich-Yen Nguyen, Matthew A. Thompson, Stanley M. Filipiak, 1996, Advanced Lithography.

Electrical linewidth measurements and simulations studying the effects of dose and gap on exposure latitude in x-ray lithography

Scott Daniel Hector, James W. Taylor, Victor Pol, 1995, Advanced Lithography.

NASA GMAO S2S Prediction System Hindcast and Near-Real Time Operations Strategy

Zhao Li, Yehui Chang, Bin Zhao, 2018 .

Overlay measurement and analysis of x-ray/optical lithography for mix-and-match device applications

Daniel J. DeMay, Robert H. Fair, James M. Oberschmidt, 1994, Advanced Lithography.

High-performance 0.25-um CMOS technology for fast SRAMs

Asanga H. Perera, Jim R. Pfiester, Matthew A. Thompson, 1996, Advanced Lithography.

Polarized phase shift mask: concept, design, and potential advantages to photolithography process and physical design

Alfred J. Reich, Matthew A. Thompson, Ruoping Wang, 2002, SPIE Photomask Technology.

Optimization of analytic density functionals by parallel genetic algorithm

Matthew A. Thompson, Brett I. Dunlap, B. Dunlap, 2008 .

Extreme ultraviolet lithography mask patterning and printability studies with a Ta-based absorber

Jonathan L. Cobb, Scott Daniel Hector, William J. Dauksher, 1999 .