Thomas Gubiotti

发表

Reflective electron-beam lithography: progress toward high-throughput production capability

Shy-Jay Lin, Wen-Chuan Wang, Regina Freed, 2012, Advanced Lithography.

Reflective electron beam lithography: lithography results using CMOS controlled digital pattern generator chip

Shy-Jay Lin, L. Haspeslagh, William M. Tong, 2013, Advanced Lithography.

Preliminary investigation of shot noise, dose, and focus latitude for e-beam direct write

Mark A. McCord, Alan Brodie, Luca Grella, 2013, Advanced Lithography.

Depth profile characterization of hydrogen implanted silicon using spectroscopic ellipsometry

Thomas Gubiotti, Ray Hoobler, David Jacy, 2003, SPIE Advanced Lithography.

Reflective electron-beam lithography performance for the 10nm logic node

Mark A. McCord, Allen Carroll, Regina Freed, 2012, Photomask Technology.

Digital pattern generator: an electron-optical MEMS for massively parallel reflective electron beam lithography

Anil U. Mane, William M. Tong, Luc Haspeslagh, 2013 .

Using scatterometry to improve process control during the spacer pitch splitting process

Thomas Gubiotti, Craig W. MacNaughton, Scott Corboy, 2009, Advanced Lithography.

Using scatterometry to improve process control during the spacer pitch splitting process

Thomas Gubiotti, Scott Corboy, Marcus Wollenweber, 2008, Lithography Asia.

Normal-incidence spectroscopic ellipsometry and polarized reflectometry for measurement and control of photoresist critical dimension

Thomas Gubiotti, Mircea V. Dusa, Ton Kiers, 2002, SPIE Advanced Lithography.