Y. Fujimura

发表

Optical emission spectroscopy study toward high rate growth of microcrystalline silicon

H. Shirai, K. Azuma, Y. Sakuma, 2001 .

Photoluminesence Properties of Nanocrystalline Si Dots Fabricated by RF Plasma-Enhanced Chemical Vapor Deposition of SiCl4 and H2 Mixture

H. Shirai, Y. Fujimura, 2002 .

Effect of Hydrothermal Condition on the Characteristics of Sludge

Nobusuke Kobayashi, Y. Itaya, Y. Fujimura, 2011 .

Chemistry of the chlorine-terminated surface for low-temperature growth of crystal silicon films by RF plasma-enhanced chemical vapor deposition

H. Shirai, Sughoan Jung, Y. Fujimura, 2002 .

Growth of Crystal Silicon Films from Chlorinated Silanes by RF Plasma-Enhanced Chemical Vapor Deposition

Haiping Liu, H. Shirai, Y. Toyoshima, 2001 .

Low-Temperature Plasma-Enahanced Chemical Vapor Deposition of Crystal Silicon Film from Dichlorosilane

Haiping Liu, H. Shirai, Chisato Fukai, 2001 .

Direct formation of crystalline silicon films on an amorphous substrate from chlorinated materials by plasma-enhanced chemical vapor deposition

H. Shirai, Y. Toyoshima, Sughoan Jung, 2002 .

Formation of Self-Assembled Nanocrystalline Silicon Dots by SiCl4/H2 RF Plasma-Enhanced Chemical Vapor Deposition

H. Shirai, Sughoan Jung, Y. Fujimura, 2001 .