E. Murliev

P‐45: In‐Ga‐Zn‐Sn‐O Amorphous Films for Transparent Electronics

V. Belyaev, R. Emirov, S. Makhmudov, 2021, SID Symposium Digest of Technical Papers.

Atomic Layer Deposition of Aluminum Nitride Using Tris(diethylamido)aluminum and Hydrazine or Ammonia

I. Abdulagatov, A. I. Abdulagatov, R. Dallaev, 2018 .

Atomic Layer Deposition of Aluminum Nitride Using Tris(diethylamido)aluminum and Hydrazine or Ammonia

I. Abdulagatov, A. Abdulagatov, R. Dallaev, 2018, Russian Microelectronics.

Synthesis of ZnO-based multylayer structures with periodic spatial localization of a donor impurity

A. Abduev, A. Asvarov, A. Akhmedov, 2022, Bulletin of the Moscow State Regional University (Physics and Mathematics).

The ZnO-In2O3 Oxide System as a Material for Low-Temperature Deposition of Transparent Electrodes

V. Kanevsky, A. Muslimov, A. Abduev, 2021, Materials.

Water-Soluble Copper Ink for the Inkjet Fabrication of Flexible Electronic Components

K. Rabadanov, D. Sobola, A. Isaev, 2021, Materials.

Transparent Conducting Amorphous IZO Thin Films: An Approach to Improve the Transparent Electrode Quality

V. Belyaev, A. Abduev, A. Asvarov, 2023, Materials.

Transparent Conductive Indium Zinc Oxide Films: Temperature and Oxygen Dependences of the Electrical and Optical Properties

V. Kanevsky, A. Muslimov, A. Akhmedov, 2022, Coatings.