N. Goel

Band offsets of atomic-layer-deposited Al2O3 on GaAs and the effects of surface treatment

Wenyong Wang, P. Ye, Y. Xuan, 2008 .

Challenges of integration of high-κ dielectric with III-V materials (Invited Paper)

P. Majhi, W. Tsai, S. Koveshnikov, 2009 .

Quantification of interfacial state density (Dit) at the high-k/III-V interface based on Hall effect measurements

Y. T. Chen, G. Bersuker, D. Veksler, 2012 .

Materials and Technologies for III-V MOSFETs

Y. Nishi, S. Oktyabrsky, W. Tsai, 2010 .